Correlation between optical, electrical and structural properties of vanadium dioxide thin films. J Mater Sci

dc.creatorMlyuka, N.R.
dc.creatorKivaisi, R.T.
dc.date2016-07-25T08:43:33Z
dc.date2016-07-25T08:43:33Z
dc.date2006-09
dc.date.accessioned2018-03-27T09:01:23Z
dc.date.available2018-03-27T09:01:23Z
dc.descriptionFull text can be accessed at http://link.springer.com/article/10.1007/s10853-006-0261-y#/page-1
dc.descriptionVO2 films have been prepared on normal microscope glass slides by reactive rf magnetron sputtering of vanadium target in a mixture of argon and oxygen. Optical properties of the films were investigated by the UV/Vis/NIR Perkin–Elmer Lamda 9. Transmission electron microscope and atomic force microscope were used to investigate the structure of the films. Correlation between structural and optical properties of VO2 thin films is investigated with respect to the dependence of both to substrate temperature.
dc.identifierMlyuka, N.R. and Kivaisi, R.T., 2006. Correlation between optical, electrical and structural properties of vanadium dioxide thin films. Journal of materials science, 41(17), pp.5619-5624.
dc.identifierhttp://hdl.handle.net/20.500.11810/3422
dc.identifier10.1007/s10853-006-0261-y
dc.identifier.urihttp://hdl.handle.net/20.500.11810/3422
dc.languageen
dc.titleCorrelation between optical, electrical and structural properties of vanadium dioxide thin films. J Mater Sci
dc.typeJournal Article

Files