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Thin Films of Metals, Metal Chalcogenides and Oxides Deposited at the Water-Oil Interface Using Molecular Precursors

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dc.creator Thomas, John P.
dc.creator Mubofu, Egid B.
dc.creator O'Brien, Paul
dc.date 2016-06-15T20:54:25Z
dc.date 2016-06-15T20:54:25Z
dc.date 2012-10
dc.date.accessioned 2018-03-27T08:54:25Z
dc.date.available 2018-03-27T08:54:25Z
dc.identifier Thomas, P.J., Mbufu, E. and O'Brien, P., 2013. Thin films of metals, metal chalcogenides and oxides deposited at the water–oil interface using molecular precursors. Chemical Communications, 49(2), pp.118-127.
dc.identifier http://hdl.handle.net/20.500.11810/2490
dc.identifier 10.1039/c2cc37146d
dc.identifier.uri http://hdl.handle.net/20.500.11810/2490
dc.description Full tyext can be accessed at http://pubs.rsc.org/en/content/articlehtml/2013/cc/c2cc37146d
dc.description The interface between two immiscible liquids is emerging as a powerful medium for the growth and deposition of nanostructured thin films of metals and compound semiconductors. Materials obtained through this exceedingly simple route seem to often adopt fascinating forms and morphologies. In this article, we outline features unique to the interface that shape the striking deposits and highlight the nature and properties of nanostructured films obtained using this technique.
dc.language en
dc.title Thin Films of Metals, Metal Chalcogenides and Oxides Deposited at the Water-Oil Interface Using Molecular Precursors
dc.type Journal Article


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